Article
Article
- Engineering & Materials
- Materials
- Chemical vapor deposition
Chemical vapor deposition
Article By:
Krumdieck, Susan P. Department of Mechanical Engineering, University of Canterbury, Christchurch, New Zealand.
Last reviewed:October 2019
DOI:https://doi.org/10.1036/1097-8542.800560
- Basic principle
- Process sequence
- Deposition rate
- Thin-film applications
- Process variations
- Developments
- Related Primary Literature
- Additional Reading
The process of producing a microscopic solid-material structure through chemically reacting vapor- or gas-phase reactants on a heated surface. Many of today's most important and most common technologies make use of very thin films of electrically active materials. Chemical vapor deposition (CVD) is a widely used manufacturing technique for products such as electric circuits and processors. Development of novel CVD processes and of new materials for advanced electronics and sensors produced by CVD are active research areas at universities and laboratories around the world. See also: Integrated circuits; Microsensor
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