Article
Article
- Engineering & Materials
- Physical electronics
- Polarization lithography
DISCLAIMER: This article is being kept online for historical purposes. Though accurate at last review, it is no longer being updated. The page may contain broken links or outdated information.
Polarization lithography
Article By:
Milster, Tom D. Optical Data Storage Center, Optical Sciences Center, The University of Arizona, Tucson, Arizona.
Flagello, Donis G. Nikon Research Corporation of America, Oro Valley, Arizona.
Last reviewed:2010
DOI:https://doi.org/10.1036/1097-8542.YB100251
- Polarization and interference
- Polarization in lithographic systems
- Related Primary Literature
- Additional Reading
Optical lithography provides a high-productivity, profitable means of making microcircuits on silicon wafers by imaging increasingly smaller features in photoresist. Polarization lithography specifically refers to the use of polarized light for illumination within an optical lithographic system to improve the quality of the imaging and the resolution. In the quest for ever-greater resolution, modern fabrication facilities all use some form of polarization lithography to produce high-technology computer chips. This article discusses basics of polarization lithography and why it is important.
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